Palladium film purification highly integrated equipment
HPE，30-60 Nm³/h
Technical parameters
Parameters | HPE-30 | HPE-60 |
Maximum flow rate (Nm³/h) | 30 | 60 |
Maximum inlet pressure | 20.7 Barg (300 psig) | |
Inlet Hydrogen Purity (Vol%) | 99.99 | |
Purity of Hydrogen Exported (Vol%) | ≥ 99.9999999 | |
Product hydrogen dew point | ≤-120 ℃ | |
N₂ purging | 5-6.8 Barg (72-98 psig) | |
N₂ explosion-proof | 6.6-9.7 Barg (95-140 psig) | |
Operating ambient temperature | -20-35 ℃ | |
Operating power requirements | 380 V 50/60 HZ | |
Operating Power Consumption (kWh) | 4 | 8 |
Device Size (L*W*HMM) | 1600*800*2200 | 2400*800*2200 |
Device Weight (kg) | 900 | 1500 |
Note: | Standard model indicators, accept batch customized requirements for development | |
Ultra-pure guarantee
-"Hand-torn steel" grade high-quality palladium tube hydrogen purification technology
- Product hydrogen purity≥ 9N, O₂, H₂O, CO, CO₂, N₂, CH₄, NMHC, He, Ar removed to <1ppb
Extremely long life
- Ultra-resistant to H₂O and O₂, resistance to fluctuations in pressure and hydrogen consumption, and resistance to unexpected power outages
- Service life ≥ 80000 h
Ultra-high security
- Nitrogen purge protection, hydrogen sensor alarm, pressure and flow monitoring
- PLC touch screen control, support data storage and fault traceability
- The whole machine is explosion-proof, highly integrated, easy to operate and maintain, silent design, and environmentally friendly
Ultra-fast response
- Full-cycle process adaptation support: covering pre-sales selection guidance, in-sale standardized installation and commissioning, and after-sales "one machine, one gear" professional maintenance
- Quick response, worry-free after-sales: Provide 7*24 hours round-the-clock support, 24-hour closed-loop solution, and solve routine faults within 36 hours
Super adaptation
MOCVD method for preparing semiconductors, LED wafer fabrication, crystal growth, etc
Palladium film purification highly integrated equipment
HPE，30-60 Nm³/h
Technical parameters
Parameters | HPE-30 | HPE-60 |
Maximum flow rate (Nm³/h) | 30 | 60 |
Maximum inlet pressure | 20.7 Barg (300 psig) | |
Inlet Hydrogen Purity (Vol%) | 99.99 | |
Purity of Hydrogen Exported (Vol%) | ≥ 99.9999999 | |
Product hydrogen dew point | ≤-120 ℃ | |
N₂ purging | 5-6.8 Barg (72-98 psig) | |
N₂ explosion-proof | 6.6-9.7 Barg (95-140 psig) | |
Operating ambient temperature | -20-35 ℃ | |
Operating power requirements | 380 V 50/60 HZ | |
Operating Power Consumption (kWh) | 4 | 8 |
Device Size (L*W*HMM) | 1600*800*2200 | 2400*800*2200 |
Device Weight (kg) | 900 | 1500 |
Note: | Standard model indicators, accept batch customized requirements for development | |
Ultra-pure guarantee
-"Hand-torn steel" grade high-quality palladium tube hydrogen purification technology
- Product hydrogen purity≥ 9N, O₂, H₂O, CO, CO₂, N₂, CH₄, NMHC, He, Ar removed to <1ppb
Extremely long life
- Ultra-resistant to H₂O and O₂, resistance to fluctuations in pressure and hydrogen consumption, and resistance to unexpected power outages
- Service life ≥ 80000 h
Ultra-high security
- Nitrogen purge protection, hydrogen sensor alarm, pressure and flow monitoring
- PLC touch screen control, support data storage and fault traceability
- The whole machine is explosion-proof, highly integrated, easy to operate and maintain, silent design, and environmentally friendly
Ultra-fast response
- Full-cycle process adaptation support: covering pre-sales selection guidance, in-sale standardized installation and commissioning, and after-sales "one machine, one gear" professional maintenance
- Quick response, worry-free after-sales: Provide 7*24 hours round-the-clock support, 24-hour closed-loop solution, and solve routine faults within 36 hours
Super adaptation
MOCVD method for preparing semiconductors, LED wafer fabrication, crystal growth, etc
